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Issue 43, 2016
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A photocurable leaky dielectric for highly electrical insulating electrohydrodynamic micro-/nanopatterns

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Abstract

This communication describes an innovative photocurable leaky dielectric for electrohydrodynamic patterning (EHDP). Based on the well-designed molecular structure, the material in its liquid state exhibits low viscosity, high homogeneity, and more importantly a leaky dielectric characteristic; meanwhile, UV light irradiation transforms it from a liquid leaky dielectric into a solid perfect dielectric instantaneously via an interfacial reaction. Two typical EHDP processes have confirmed that the beneficial properties of this material help to rapidly fulfill a higher aspect ratio and/or smaller feature size patterning compared to its perfect dielectric counterpart. Therefore, this material provides the potential in accessing high-performance EHDP towards fabricating electrically insulating micro-/nanostructures.

Graphical abstract: A photocurable leaky dielectric for highly electrical insulating electrohydrodynamic micro-/nanopatterns

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Publication details

The article was received on 18 May 2016, accepted on 14 Sep 2016 and first published on 14 Sep 2016


Article type: Communication
DOI: 10.1039/C6SM01151A
Citation: Soft Matter, 2016,12, 8819-8824
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    A photocurable leaky dielectric for highly electrical insulating electrohydrodynamic micro-/nanopatterns

    G. Wang, G. Lv, S. Zhang, J. Shao, X. Li, H. Tian, D. Yu and L. Zhang, Soft Matter, 2016, 12, 8819
    DOI: 10.1039/C6SM01151A

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