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Issue 102, 2016
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Gas-phase kinetic and mechanistic investigation of the OH radical and Cl atom oxidation of tetraethoxysilane

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Abstract

Rate coefficients have been determined in a large photoreactor for the reaction of OH radicals and Cl atoms with tetraethoxysilane (TEOS, (CH3CH2O)4Si) using a relative kinetic method and in situ FTIR spectroscopy for the analysis. Values of (2.99 ± 0.37) × 10−11 and (2.41 ± 0.47) × 10−10 cm3 per molecule per s were obtained for the reactions of OH and Cl with TEOS, respectively, at 298 K and atmospheric pressure. The products originating from the OH-radical and Cl-atom initiated oxidation of TEOS have also been investigated. Acetic acid (CH3C(O)OH) is observed as a major product in both cases with a molar yield of (95 ± 4)%. An oxidation mechanism is proposed to explain its formation and the possible identity of the co-product(s) is discussed.

Graphical abstract: Gas-phase kinetic and mechanistic investigation of the OH radical and Cl atom oxidation of tetraethoxysilane

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Publication details

The article was received on 08 Sep 2016, accepted on 14 Oct 2016 and first published on 17 Oct 2016


Article type: Paper
DOI: 10.1039/C6RA22473C
Citation: RSC Adv., 2016,6, 100577-100584
  • Open access: Creative Commons BY license
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    Gas-phase kinetic and mechanistic investigation of the OH radical and Cl atom oxidation of tetraethoxysilane

    I. Barnes and P. Wiesen, RSC Adv., 2016, 6, 100577
    DOI: 10.1039/C6RA22473C

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