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Issue 91, 2016, Issue in Progress
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Monohydride signature as a key predictor of successful Si(110) surface functionalization

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Abstract

Methyl-terminated (110)-oriented silicon surfaces have been prepared from monohydride-terminated, H–Si(110) surfaces using a chlorination/alkylation procedure. Transmission infrared spectroscopy of the H–Si(110) surfaces showed absorption features indicating monohydride structures along the [−110] direction. X-ray photoelectron spectroscopy was used to characterize the methyl-terminated, CH3–Si(110), surfaces. Surface coverage calculations revealed 0.83 of an equivalent monolayer coverage for methyl-terminated Si(110) surfaces. No oxidation of silicon was observed in the high-resolution Si 2p spectra and the samples were stable against oxidation over time, with only 0.2 of a monolayer of surface oxide observed a month after the sample preparation. Thus, the chlorination/alkylation procedure can be used for the functionalization of monohydride Si(110) surfaces with improved long term stability.

Graphical abstract: Monohydride signature as a key predictor of successful Si(110) surface functionalization

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Publication details

The article was received on 14 Jul 2016, accepted on 06 Sep 2016 and first published on 07 Sep 2016


Article type: Paper
DOI: 10.1039/C6RA18009D
Citation: RSC Adv., 2016,6, 88239-88243
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    Monohydride signature as a key predictor of successful Si(110) surface functionalization

    A. Gupta, J. P. Bruce, K. McEleney, M. S. Freund and D. R. Oliver, RSC Adv., 2016, 6, 88239
    DOI: 10.1039/C6RA18009D

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