Issue 45, 2016, Issue in Progress

Eco-friendly photolithography using water-developable pure silk fibroin

Abstract

We report that pure silk fibroin can be a green and biofunctional photoresist for deep ultraviolet photolithography. All processes are entirely water-based, from resist solvent to resist removal, and rely on the phototendering effect that decreases the crystallinity of silk fibroin films by DUV exposure. Additionally, the potential decrease in activity of bio-dopants due to high-energy irradiation is irrelevant to our positive-tone lithographic method.

Graphical abstract: Eco-friendly photolithography using water-developable pure silk fibroin

Supplementary files

Article information

Article type
Communication
Submitted
19 Feb 2016
Accepted
28 Mar 2016
First published
14 Apr 2016

RSC Adv., 2016,6, 39330-39334

Eco-friendly photolithography using water-developable pure silk fibroin

J. Park, S. Lee, B. Marelli, M. Lee, T. Kim, H. Oh, H. Jeon, F. G. Omenetto and S. Kim, RSC Adv., 2016, 6, 39330 DOI: 10.1039/C6RA04516B

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