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Issue 7, 2016
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Fabrication of a nano-scale pattern with various functional materials using electrohydrodynamic lithography and functionalization

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Abstract

Direct patterning with inorganic based materials has been studied using many lithographic techniques. Among lithographic methods, electro-hydrodynamic lithography (EHL) is a good candidate to obtain a fine inorganic pattern. Being a minimal contact patterning technique, our method is simple, versatile and inexpensive, and has the potential to become a powerful tool for realizing inorganic based nanostructures on a wafer scale. Inorganic precursor resists are exploited here as relatively high-speed resists compared to macromolecule resists in an effort to reduce the patterning time significantly. These resists are developed to have functionalities via a thermal annealing process which can be used in versatile applications. An amorphous inorganic precursor pattern fabricated by EHL is transitioned to a crystalline phase via an annealing process. Herein, functional material patterns such as TiO2, VO2, Fe3O4, and PZT are successfully fabricated and functionalized via EHL and the annealing process.

Graphical abstract: Fabrication of a nano-scale pattern with various functional materials using electrohydrodynamic lithography and functionalization

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Publication details

The article was received on 19 Nov 2015, accepted on 05 Jan 2016 and first published on 08 Jan 2016


Article type: Communication
DOI: 10.1039/C5RA24493E
Citation: RSC Adv., 2016,6, 5944-5948
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    Fabrication of a nano-scale pattern with various functional materials using electrohydrodynamic lithography and functionalization

    S. Lee, S. H. Jung, D. J. Kang and J. Lee, RSC Adv., 2016, 6, 5944
    DOI: 10.1039/C5RA24493E

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