Nanoscale

A high impact peer reviewed journal publishing experimental and theoretical work across the breadth of nanoscience and nanotechnology

Paper

A novel 2-step ALD route to ultra-thin MoS2 films on SiO2 through a surface organometallic intermediate

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Corresponding authors
a
Univ. Grenoble Alpes, FR-38000 Grenoble, CEA, LETI, Minatec Campus, FR-38054 Grenoble Cedex 9, France
E-mail: francois.martin@cea.fr
b
Université de Lyon, C2P2 – UMR 5265 (CNRS – Université de Lyon 1 – CPE Lyon), Équipe Chimie Organométallique de Surface CPE Lyon, 43 Boulevard du 11 Novembre 1918, FR-69616 Villeurbanne Cedex, France
E-mail: alessandra.quadrelli@cpe.fr
c
Univ. Grenoble Alpes, FR-38000 Grenoble, CEA, INAC, SP2 M, Minatec Campus, FR-38054 Grenoble Cedex 9, France
Nanoscale, 2016, Advance Article

DOI: 10.1039/C6NR06021H
Received 29 Jul 2016, Accepted 23 Sep 2016
First published online 26 Sep 2016
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