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Issue 14, 2016
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Self limiting atomic layer deposition of Al2O3 on perovskite surfaces: a reality?

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Abstract

The feasibility of self-saturated atomic layer deposition of Al2O3 on an organolead halide perovskite (MAPbI3−xClx) surface through a well known trimethylaluminium (TMA)–water (H2O) chemistry is studied. Though the sequential dosages of reactants form films on the perovskite surfaces, a self saturated growth is never observed. Self-saturation leads to the degradation of the material. Both experimental and density functional theory calculations are carried out for complete understanding of the growth mechanism of self-limiting Al2O3 on the perovskite surface.

Graphical abstract: Self limiting atomic layer deposition of Al2O3 on perovskite surfaces: a reality?

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Publication details

The article was received on 08 Oct 2015, accepted on 07 Mar 2016 and first published on 08 Mar 2016


Article type: Paper
DOI: 10.1039/C5NR06974B
Author version available: Download Author version (PDF)
Citation: Nanoscale, 2016,8, 7459-7465
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    Self limiting atomic layer deposition of Al2O3 on perovskite surfaces: a reality?

    D. Choudhury, G. Rajaraman and S. K. Sarkar, Nanoscale, 2016, 8, 7459
    DOI: 10.1039/C5NR06974B

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