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Journal of Analytical Atomic Spectrometry

Innovative research on the fundamental theory and application of spectrometric techniques.


Study of ion beam induced chemical effects in silicon with a downsized high resolution X-ray spectrometer for use with focused ion beams

Corresponding authors
Ruđer Bošković Institut, Bijenička Cesta 54, HR-10000 Zagreb, Croatia
E-mail: ibozicev@irb.hr, stjepko.fazinic@irb.hr
J. Anal. At. Spectrom., 2016,31, 2293-2304

DOI: 10.1039/C6JA00276E
Received 28 Jul 2016, Accepted 16 Sep 2016
First published online 16 Sep 2016
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