Journal of Analytical Atomic Spectrometry

Innovative research on the fundamental theory and application of spectrometric techniques.


Study of ion beam induced chemical effects in silicon with a downsized high resolution X-ray spectrometer for use with focused ion beams

Corresponding authors
Ruđer Bošković Institut, Bijenička Cesta 54, HR-10000 Zagreb, Croatia
J. Anal. At. Spectrom., 2016,31, 2293-2304

DOI: 10.1039/C6JA00276E
Received 28 Jul 2016, Accepted 16 Sep 2016
First published online 16 Sep 2016
Please wait while Download options loads