Issue 3, 2017

Spontaneous Si–C bond cleavage in (TriphosSi)-nickel complexes

Abstract

Herein, we report on the versatile reactions of CH3C(CH2PPh2)3 as well as CH3Si(CH2PPh2)3 derived Ni-complexes. While Ni[CH3C(CH2PPh2)3] complexes reveal high stability, the Ni[CH3Si(CH2PPh2)3] analogs show rapid decomposition at room temperature and afford the unprecedented pseudo-tetrahedral phosphino methanide complex 5. We provide a detailed electronic structure of 5 from X-ray absorption and emission spectroscopy data analysis in combination with DFT calculations, as well as from comparison with structurally related complexes. A mechanistic study for the formation of complex 5 by reaction with BF4 is presented, based on a comparison of experimental data with quantum chemical calculations. We also show a simple route towards isolable Ni(I)-complexes on the gram scale.

Graphical abstract: Spontaneous Si–C bond cleavage in (TriphosSi)-nickel complexes

Supplementary files

Article information

Article type
Paper
Submitted
21 Oct 2016
Accepted
08 Dec 2016
First published
08 Dec 2016
This article is Open Access
Creative Commons BY license

Dalton Trans., 2017,46, 907-917

Spontaneous Si–C bond cleavage in (TriphosSi)-nickel complexes

A. Petuker, S. Mebs, N. Schuth, P. Gerschel, M. L. Reback, B. Mallick, M. van Gastel, M. Haumann and U. Apfel, Dalton Trans., 2017, 46, 907 DOI: 10.1039/C6DT04048A

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