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Atomic layer deposition of diisopropylaminosilane on WO3(001) and W(110): a density functional theory study

Corresponding authors
Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, South Korea
E-mail: ys1231.shim@samsung.com
Memory Manufacturing Operation Center, Samsung Electronics Co., Ltd, 1, Samsungjeonja-ro, Hwasung, South Korea
Phys. Chem. Chem. Phys., 2016, Advance Article

DOI: 10.1039/C6CP05720A
Received 18 Aug 2016, Accepted 28 Sep 2016
First published online 28 Sep 2016
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