Issue 6, 2016

Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal–organic framework thin films

Abstract

Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(II)terephthalate metal–organic framework (MOF) thin films on various substrate surfaces. The films are grown from two gaseous precursors with a digital atomic/molecular level control for the film thickness under relatively mild conditions in a simple and fast one-step process.

Graphical abstract: Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal–organic framework thin films

Article information

Article type
Communication
Submitted
14 Oct 2015
Accepted
17 Nov 2015
First published
18 Nov 2015

Chem. Commun., 2016,52, 1139-1142

Author version available

Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal–organic framework thin films

E. Ahvenniemi and M. Karppinen, Chem. Commun., 2016, 52, 1139 DOI: 10.1039/C5CC08538A

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