Issue 2, 2015

Soluble polycyclosilane–polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity

Abstract

A polycyclosilane precursor was synthesized to develop soluble silicon materials and silicon thin films with optical properties at 193 nm, high silicon content, and etch selectivity for O2 and CFx plasmas. A new class of polycyclosilane–polysiloxane hybrid materials and their thin films exhibited good etch selectivity and good optical properties at 193 nm without organic absorbents.

Graphical abstract: Soluble polycyclosilane–polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity

Supplementary files

Article information

Article type
Communication
Submitted
27 Aug 2014
Accepted
09 Nov 2014
First published
12 Nov 2014

J. Mater. Chem. C, 2015,3, 239-242

Author version available

Soluble polycyclosilane–polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity

S. J. Park, H. M. Cho, M. E. Lee, M. Kim, K. Han, S. Hong, S. Lim, H. Lee, B. Hwang, S. K. Kim, S. Shim, P. Kang and M. Choi, J. Mater. Chem. C, 2015, 3, 239 DOI: 10.1039/C4TC01917B

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