Issue 16, 2015

Novel chlorine resistant low-fouling ultrafiltration membrane based on a hydrophilic polyaniline derivative

Abstract

We demonstrate that poly(n-2-hydroxyethyl aniline) (n-PANi), a derivative of polyaniline (PANi), provides an effective chlorine tolerant PANi-based ultrafiltration (UF) membrane. n-PANi was synthesized from its monomer via chemical oxidative polymerization. Unlike PANi, n-PANi can be dissolved in N-methyl-2-pyrollidone (NMP) up to 30 wt% to form a casting solution which is stable for months without the aid of an anti-gelling agent. Membranes formed from n-PANi show high resistance to chlorine, even when exposed to 250 ppm sodium hypochlorite for 30 days while PANi membranes completely lose their ability to reject bovine serum albumin (BSA, 6 nm) after 2 days. Spectroscopic studies indicate that the benzenoid groups in PANi membranes are oxidized while n-PANi membranes maintain their chemical structure. n-PANi membranes display high hydrophilicity with a contact angle of ∼36 degrees which contributes to their ultra-low adhesion of E. coli. Cross-flow fouling tests with 1.5 g L−1 BSA fouling solution reveal that n-PANi membranes exhibit low-fouling properties with only 11% flux decline and 91% flux recovery, superior to PANi and commercial polysulfone (PSf) membranes.

Graphical abstract: Novel chlorine resistant low-fouling ultrafiltration membrane based on a hydrophilic polyaniline derivative

Article information

Article type
Paper
Submitted
03 Feb 2015
Accepted
11 Mar 2015
First published
11 Mar 2015

J. Mater. Chem. A, 2015,3, 8725-8733

Author version available

Novel chlorine resistant low-fouling ultrafiltration membrane based on a hydrophilic polyaniline derivative

X. Huang, B. T. McVerry, C. Marambio-Jones, M. C. Y. Wong, E. M. V. Hoek and R. B. Kaner, J. Mater. Chem. A, 2015, 3, 8725 DOI: 10.1039/C5TA00900F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements