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Issue 17, 2015
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Three-step sequential solution deposition of PbI2-free CH3NH3PbI3 perovskite

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Abstract

We demonstrate a three-step sequential solution process to prepare PbI2-free CH3NH3PbI3 perovskite films. In this three-step method, a thermally unstable stoichiometric PbI2·CH3NH3Cl precursor film is first deposited on the mesoporous TiO2 substrate, followed by thermal decomposition to form PbI2, which is finally converted into CH3NH3PbI3 by dipping in a regular isopropanol solution of CH3NH3I at room temperature. In comparison to the two-step approach using similar processing conditions, the three-step method enables the formation of the PbI2 film through the thermal decomposition of the PbI2·CH3NH3Cl precursor film. This facilitates a rapid conversion of PbI2 to CH3NH3PbI3 without any traceable residue PbI2 in the final conversion step, leading to an improved device performance.

Graphical abstract: Three-step sequential solution deposition of PbI2-free CH3NH3PbI3 perovskite

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Publication details

The article was received on 09 Oct 2014, accepted on 25 Nov 2014 and first published on 26 Nov 2014


Article type: Communication
DOI: 10.1039/C4TA05384B
Author version available: Download Author version (PDF)
Citation: J. Mater. Chem. A, 2015,3, 9086-9091
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    Three-step sequential solution deposition of PbI2-free CH3NH3PbI3 perovskite

    Y. Zhao and K. Zhu, J. Mater. Chem. A, 2015, 3, 9086
    DOI: 10.1039/C4TA05384B

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