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Issue 105, 2015
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Eco-friendly water-induced aluminum oxide dielectrics and their application in a hybrid metal oxide/polymer TFT

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Abstract

Solution-processed oxide semiconductors have been widely studied with the objective of achieving high-performance, sustainable and low-cost electronic devices. In this report a simple and eco-friendly water-inducement method has been developed to fabricate high-k dielectrics and hybrid thin-film transistors (TFTs); introducing metal nitrates and deionized water as the precursor materials. The AlOx dielectric films annealed at temperatures higher than 350 °C result in low leakage current densities and the dielectric constants are nearly 7. Instead of the conventional oxide semiconductors, water-induced (WI) polyvinylprrolidone (PVP) was introduced into the In2O3 solution to form a hybrid metal oxide/polymer channel layer. The 250 °C-annealed WI In2O3 : PVP TFTs based on AlOx dielectric exhibit outstanding electrical performances and high stability. These promising properties were obtained at an ultra-low operating voltage of 2 V. The WI metal oxide/polymer hybrid TFTs are promising alternatives for applications in low-cost, low-consumption and eco-friendly flexible electronics.

Graphical abstract: Eco-friendly water-induced aluminum oxide dielectrics and their application in a hybrid metal oxide/polymer TFT

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Publication details

The article was received on 02 Aug 2015, accepted on 06 Oct 2015 and first published on 07 Oct 2015


Article type: Paper
DOI: 10.1039/C5RA15370K
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Citation: RSC Adv., 2015,5, 86606-86613
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    Eco-friendly water-induced aluminum oxide dielectrics and their application in a hybrid metal oxide/polymer TFT

    A. Liu, G. Liu, H. Zhu, B. Shin, E. Fortunato, R. Martins and F. Shan, RSC Adv., 2015, 5, 86606
    DOI: 10.1039/C5RA15370K

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