Issue 49, 2015

Asymmetric binuclear Ni(ii) and Cu(ii) Schiff base metallopolymers

Abstract

New asymmetric Cu(II)/Cu(II) and Ni(II)/Ni(II) binuclear Schiff base complexes were synthesised via a one-pot reaction introducing two different aldehyde building blocks (R = H, t-Bu). These complexes were successfully electropolymerised to afford new metallopolymers using different sweep scan rates (50, 100 and 200 mV s−1) between 0 and 1.4 V. Surface coverage – (Γ) values were determined assuming ligand-based conduction and are of about 10−7 mol cm−2 for both polymers. Atomic force microscopy (AFM) images showed morphological differences between Cu(II) and Ni(II) polymers with root mean square roughness (Rq) higher for the former. DFT studies support the ligand based electropolymerisation mechanism, based on the electron density of the cation at the para position of the phenolate ring, and suggest that copper dimers prefer slipped square planar geometry, with one Cu–O weak bond between adjacent units, rather than stack as in Ni(II) dimers, in agreement with the AFM observations.

Graphical abstract: Asymmetric binuclear Ni(ii) and Cu(ii) Schiff base metallopolymers

Supplementary files

Article information

Article type
Paper
Submitted
27 Feb 2015
Accepted
24 Apr 2015
First published
24 Apr 2015

RSC Adv., 2015,5, 39495-39504

Asymmetric binuclear Ni(II) and Cu(II) Schiff base metallopolymers

S. Realista, A. S. Viana, B. D. P. Cardoso, A. M. Botelho do Rego, P. D. Vaz, A. I. Melato, P. N. Martinho and M. J. Calhorda, RSC Adv., 2015, 5, 39495 DOI: 10.1039/C5RA03560K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements