Issue 1, 2015
From the journal:

RSC Advances

In situ photogalvanic acceleration of optofluidic kinetics: a new paradigm for advanced photocatalytic technologies†

Huizhi Wang,a   Xiaojiao Luo,bd   Michael K. H. Leung,c   Dennis Y. C. Leung,b   Zhiyong Tang,d   Hailiang Wang,e   Rafael Luquef  and  Jin Xuan*a  

* Corresponding authors

a School of Engineering and Physical Sciences, Heriot-Watt University, Edinburgh, UK
E-mail: j.xuan@hw.ac.uk
Fax: +44 (0)131 451 3129
Tel: +44 (0)131 451 3293

b Department of Mechanical Engineering, The University of Hong Kong, Pok Fu Lam, Hong Kong

c Ability R&D Energy Research Centre, School of Energy and Environment, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong

d CAS Key Laboratory of Low-Carbon Conversion Science and Engineering, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201210, China

e Department of Chemistry, Yale University, West Haven, CT, USA

f Departamento de Química Orgánica, Universidad de Córdoba, Edif. Marie Curie, Ctra Nnal IV-A, Km 396, E14014 Córdoba, Spain

Abstract

A multiscale-designed optofluidic reactor is demonstrated in this work, featuring an overall reaction rate constant of 1.32 sāˆ’1 for photocatalytic decolourization of methylene blue, which is an order of magnitude higher as compared to literature records. A novel performance-enhancement mechanism of microscale in situ photogalvanic acceleration was found to be the main reason for the superior optofluidic performance in the photocatalytic degradation of dyes as a model reaction.

Graphical abstract: In situ photogalvanic acceleration of optofluidic kinetics: a new paradigm for advanced photocatalytic technologies

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Article information

DOI
https://doi.org/10.1039/C4RA14032J
Article type
Communication
Submitted
17 Oct 2014
Accepted
19 Nov 2014
First published
25 Nov 2014

RSC Adv., 2015,5, 791-796

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In situ photogalvanic acceleration of optofluidic kinetics: a new paradigm for advanced photocatalytic technologies

H. Wang, X. Luo, M. K. H. Leung, D. Y. C. Leung, Z. Tang, H. Wang, R. Luque and J. Xuan, RSC Adv., 2015, 5, 791 DOI: 10.1039/C4RA14032J

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