Issue 30, 2015

Synthesis and investigation of an erbium-containing photosensitive polymer

Abstract

Er organic complexes are generally used in polymer-based optical amplifiers by doping. This study presents a method for creating an Er-containing photosensitive polymer by free radical copolymerization. Two types of Er organic complexes containing polymeric reactivity groups were synthesized and investigated. Er(TTA)2(Phen)(MA), which has high photoluminescence, was polymerized with glycidyl methacrylate (GMA) for use as a novel UV-written polymer material. Poly(GMA-co-Er(TTA)2(Phen)(MA) was prepared with different proportions of Er, and its spectroscopic properties were investigated in detail. Polymer films with the optimum proportion (the molar ratio of GMA and Er(TTA)2(Phen)(MA) was 115 : 1) exhibited good UV-light lithographic sensitivity, narrow near-infrared luminescence, good thermal stability (Td: up to 303 °C), and solvent resistance after crosslinking. Micropatterns with smooth top surfaces were fabricated from the resulting polymer by direct UV exposure and chemical development.

Graphical abstract: Synthesis and investigation of an erbium-containing photosensitive polymer

Supplementary files

Article information

Article type
Paper
Submitted
30 Apr 2015
Accepted
15 Jun 2015
First published
16 Jun 2015

Polym. Chem., 2015,6, 5430-5436

Author version available

Synthesis and investigation of an erbium-containing photosensitive polymer

D. Fan, X. Fei, J. Tian, L. Xu, X. Wang, S. Fan and Y. Wang, Polym. Chem., 2015, 6, 5430 DOI: 10.1039/C5PY00638D

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