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Paper

Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon

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Corresponding authors
a
Department of Chemical and Biomolecular Engineering, Rice University, Houston, USA
b
Department of Chemistry, Rice University, Houston, USA
E-mail: arb@rice.edu
Tel: +1 713 348 5610
c
Department of Materials Science and Nanoengineering, Rice University, Houston, USA
d
Energy Safety Research Institute, College of Engineering, Swansea University, Singleton Park, Swansea SA2 8PP, UK
J. Mater. Chem. A, 2014,2, 12043-12052

DOI: 10.1039/C4TA02006E
Received 22 Apr 2014, Accepted 31 May 2014
First published online 04 Jun 2014
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