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Issue 81, 2014
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Molecular level controlled fabrication of highly transparent conductive reduced graphene oxide/silver nanowire hybrid films

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Abstract

Due to the scalability of production and the convenience in processing, graphene oxide (GO) has become an important precursor for the fabrication of transparent conductive films (TCFs). Developing a method to reduce the high contact resistance between the GO sheets, which is mainly due to the presence of a huge number of intersheet junctions, is the key for these applications. Here, we demonstrate a method of molecular level controlled fabrication of hybrid TCFs composed of 1-dimensional (1D) silver nanowires (Ag NWs) and 2-dimensional (2D) reduced graphene oxide (rGO) sheets. The ultra-large graphene oxide (UL-GO) sheets were transferred onto the quartz substrate via the Langmuir–Blodgett (L–B) method and then covered with Ag NW by the spin-coating method. The hybrid film was then reduced by chemical reduction using hydrazine hydrate. Upon varying the amount of Ag NW, the reduced UL-GO/Ag NW hybrid films show low sheet resistance ranging 13 to 48 Ω sq−1 with optical transmittance ranging from 71.9% to 91.2%. The direct current (DC) to optical conductivity ratio of the hybrid films can reach up to 81, which is comparable to that of indium tin oxide (ITO).

Graphical abstract: Molecular level controlled fabrication of highly transparent conductive reduced graphene oxide/silver nanowire hybrid films

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Publication details

The article was received on 17 Jul 2014, accepted on 02 Sep 2014 and first published on 03 Sep 2014


Article type: Paper
DOI: 10.1039/C4RA07228F
Citation: RSC Adv., 2014,4, 43270-43277
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    Molecular level controlled fabrication of highly transparent conductive reduced graphene oxide/silver nanowire hybrid films

    L. Shi, J. Yang, T. Yang, Q. Hanxun, J. Li and Q. Zheng, RSC Adv., 2014, 4, 43270
    DOI: 10.1039/C4RA07228F

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