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Issue 17, 2014
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Butyl lithium assisted direct grafting of polyoligomeric silsesquioxane onto graphene

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Abstract

Polyoligomeric silsesquioxane (POSS) decorated graphene nanoplatelets were synthesized using n-butyl lithium (n-BuLi). The isolated topological defects present along the edges of graphite played a crucial role in the grafting process. n-BuLi specifically scavenged the protons from these defect sites. These reactive anionic centres generated in situ, react with the POSS. Various microscopic characterization techniques indicated functionalization of the edges of graphene nanoplatelets. Further, highly exfoliated graphene layers were observed after modification. The present functionalization technique avoids the use of harsh oxidation techniques of graphite, which are commonly used for secondary modification of graphene.

Graphical abstract: Butyl lithium assisted direct grafting of polyoligomeric silsesquioxane onto graphene

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Publication details

The article was received on 19 Oct 2013, accepted on 12 Dec 2013 and first published on 20 Dec 2013


Article type: Paper
DOI: 10.1039/C3RA47373B
Citation: RSC Adv., 2014,4, 8649-8656
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    Butyl lithium assisted direct grafting of polyoligomeric silsesquioxane onto graphene

    T. Mondal, A. K. Bhowmick and R. Krishnamoorti, RSC Adv., 2014, 4, 8649
    DOI: 10.1039/C3RA47373B

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