Issue 2, 2015

A series of cobalt and nickel clusters based on thiol-containing ligands accompanied by in situ ligand formation

Abstract

Eight cobalt and nickel clusters with the formulae [Co44-O)(MBT)52-Piv)] (1), [Ni3(MBT)2(L1)2(OCH3)2] (2), [Ni43-S)(μ3-S2)(MBT)2(L2)] (3), [Ni4(L3)4] (4), [Ni64-S)3(MBT)6]·(C2H5OH)2 (5), H[Co44-O)(HMBI)6]·(NO3)(TEA)0.5(CH3OH)2(H2O) (6), [Ni2(HMBI)4]·(CH3OH)2 (7), and [Ni5(MBI)2(HMBI)4(OCH3)2]·(CH3OH)3(H2O)2 (8) (HPiv = pivalic acid, HL1 = 2-disulfanylbenzo[d]thiazole, H2L2 = (Z)-2-((2-mercaptophenyl)imino)benzo[d]thiazole-3(2H)-thiol, H2L3 = (Z)-2-(benzo[d]thiazol-2(3H)-ylideneamino)benzenethiol, TEA = triethylamine) have been solvothermally prepared via assembling distinct metal resource and thiol-containing ligands 2-mercaptobenzothiazole (HMBT)/2-mercaptobenzimidazole (H2MBI). Complexes 1 and 6 are tetrahedral cobalt clusters. Complex 2 features linear arrangement of nickel ions. Complexes 3 and 4 are tetranuclear nickel clusters with the butterfly and square shape, respectively. Complex 5 displays a trigonal prism geometry. Complexes 7 and 8 exhibit paddle-wheel and trigonal bipyramidal geometry, respectively. The starting ligand HMBT undergoes in situ ligand transformation in the formation of the nickel clusters, and the new generated inorganic ligands (S2− and S22−) and organic ligands (HL1, H2L2 and H2L3) were captured within the metallic cores. Magnetic studies indicate that complexes 1 and 6 show dominating antiferromagnetic couplings and that spin frustration exists in 6.

Graphical abstract: A series of cobalt and nickel clusters based on thiol-containing ligands accompanied by in situ ligand formation

Supplementary files

Article information

Article type
Paper
Submitted
09 Oct 2014
Accepted
22 Oct 2014
First published
24 Oct 2014

Dalton Trans., 2015,44, 560-567

Author version available

A series of cobalt and nickel clusters based on thiol-containing ligands accompanied by in situ ligand formation

S. Han, X. Miao, S. Liu and X. Bu, Dalton Trans., 2015, 44, 560 DOI: 10.1039/C4DT03109A

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