Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymerlithography combined with resist design†
Abstract
The control of order and orientation of the self-assembly of cylinder-forming poly(styrene-b-dimethylsiloxane)
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* Corresponding authors
a
Laboratoire des Technologies de la Microélectronique, CNRS/UJF-Grenoble1/CEA LTM, 17 rue des Martyrs, 38054 Grenoble, France
E-mail:
Marc.zelsmann@cea.fr
b Tyndall National Institute, Lee Maltings, Prospect Row, Cork, Ireland
c Department of Chemistry, University College Cork, Cork, Ireland
d Catalan Institute of Nanotechnology, Campus de la UAB, Edifici CM3, 08193 Bellaterra, Spain
e Profactor GmbH, Functional Surfaces and Nanostructures, 4407 Steyr-Gleink, Austria
f Intel Ireland Limited, Collinstown Industrial Estate, Co. Kildare, Leixlip, Ireland
g Catalan Institute of Research and Advanced Studies (ICREA), 08010 Barcelona, Spain
h Physics Department, Universitat Autònoma de Barcelona, Campus de la UAB, 08193 Bellaterra, Spain
i Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin, Ireland
The control of order and orientation of the self-assembly of cylinder-forming poly(styrene-b-dimethylsiloxane)
M. Salaun, M. Zelsmann, S. Archambault, D. Borah, N. Kehagias, C. Simao, O. Lorret, M. T. Shaw, C. M. Sotomayor Torres and M. A. Morris, J. Mater. Chem. C, 2013, 1, 3544 DOI: 10.1039/C3TC30300D
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