Issue 7, 2013

Controlled thiol–ene post-polymerization reactions on polyferrocenylsilane homopolymers and block copolymers

Abstract

Various thiols were reacted with poly(ferrocenylmethylvinylsilane) (PFMVS) homopolymers using the radical-mediated thiolene reaction with a view to preparing metallopolymers with diverse functional groups. Post-polymerization thiol–ene reactions on poly(ferrocenyldimethylsilane)-b-poly(ferrocenylmethylvinylsilane) (PFDMS-b-PFMVS) diblock copolymers with dodecanethiol and octadecanethiol afforded diblocks with a long hexane-soluble block and a short crystalline, hexane-insoluble PFDMS block. The thiol–ene reactions provided sufficient control to allow access to diblocks that were partially substituted, thus leaving vinyl groups that might subsequently be used for further post-polymerization reactions.

Graphical abstract: Controlled thiol–ene post-polymerization reactions on polyferrocenylsilane homopolymers and block copolymers

Supplementary files

Article information

Article type
Paper
Submitted
19 Dec 2012
Accepted
24 Jan 2013
First published
13 Feb 2013

Polym. Chem., 2013,4, 2353-2360

Controlled thiol–ene post-polymerization reactions on polyferrocenylsilane homopolymers and block copolymers

L. Chabanne, S. Pfirrmann, D. J. Lunn and I. Manners, Polym. Chem., 2013, 4, 2353 DOI: 10.1039/C3PY21129K

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