Jump to main content
Jump to site search

Issue 14, 2013
Previous Article Next Article

Investigation of non-segregation graphene growth on Ni via isotope-labeled alcohol catalytic chemical vapor deposition

Author affiliations

Abstract

Here we present CVD growth of graphene on Ni and investigate the growth mechanism using isotopically labeled 13C-ethanol as the precursor. Results show that during low-pressure alcohol catalytic CVD (LP-ACCVD), a growth time of less than 30 s yields graphene films with high surface coverage (>80%). Moreover, when isotopically labeled ethanol precursors were sequentially introduced, Raman mapping revealed that both 12C and 13C graphene flakes exist. This shows that even at high temperature (∼900 °C) the graphene flakes form independently, suggesting a different growth mechanism for ethanol-derived graphene on Ni from the segregation process for methane-derived graphene. We interpret this growth mechanism using a direct surface-adsorptive growth model in which small carbon fragments catalyzed from ethanol decomposition products first nucleate at metal step edges or grain boundaries to initiate graphene growth, and then expand over the entire metal surface.

Graphical abstract: Investigation of non-segregation graphene growth on Ni via isotope-labeled alcohol catalytic chemical vapor deposition

Back to tab navigation

Supplementary files

Publication details

The article was received on 03 Mar 2013, accepted on 10 May 2013 and first published on 15 May 2013


Article type: Paper
DOI: 10.1039/C3NR01080E
Citation: Nanoscale, 2013,5, 6530-6537
  •   Request permissions

    Investigation of non-segregation graphene growth on Ni via isotope-labeled alcohol catalytic chemical vapor deposition

    P. Zhao, B. Hou, X. Chen, S. Kim, S. Chiashi, E. Einarsson and S. Maruyama, Nanoscale, 2013, 5, 6530
    DOI: 10.1039/C3NR01080E

Search articles by author

Spotlight

Advertisements