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Generation of scalable quasi-3D metallo-dielectric SERS substrates through orthogonal reactive ion etching

Wonmi Ahn, Yue Qiu and Björn M. Reinhard
J. Mater. Chem. C, 2013,1, 3110-3118

DOI: 10.1039/C3TC30110A
Received 17 Jan 2013, Accepted 21 Mar 2013
First published online 25 Mar 2013
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