Jump to main content
Jump to site search

Issue 2, 2013
Previous Article Next Article

Solvent-induced formation of unidirectionally curved and tilted Si nanowires during metal-assisted chemical etching

Author affiliations

Abstract

We present a new approach for inducing the formation of unidirectionally slanted or curved silicon nanowires (SiNWs) via metal-assisted chemical etching by introducing various co-solvents to the etching solution. The effects of adding methanol, ethanol, 2-propanol, and acetonitrile to the HF–H2O2–H2O system are studied. It is demonstrated that simply by controlling the type and the amount of co-solvent, such wires can be fabricated over a large area and the wire curvature can be tuned.

Graphical abstract: Solvent-induced formation of unidirectionally curved and tilted Si nanowires during metal-assisted chemical etching

Back to tab navigation

Publication details

The article was received on 23 Aug 2012, accepted on 19 Sep 2012 and first published on 01 Nov 2012


Article type: Communication
DOI: 10.1039/C2TC00041E
Citation: J. Mater. Chem. C, 2013,1, 220-224
  •   Request permissions

    Solvent-induced formation of unidirectionally curved and tilted Si nanowires during metal-assisted chemical etching

    Y. Kim, A. Tsao, D. H. Lee and R. Maboudian, J. Mater. Chem. C, 2013, 1, 220
    DOI: 10.1039/C2TC00041E

Search articles by author

Spotlight

Advertisements