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Issue 1, 2013
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Freestanding silicon films formed on ionic liquid surfaces

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Abstract

Freestanding silicon films with a thickness ranging from 1 nm to several micrometers were prepared by Cat-CVD onto ionic liquid ([BMIM][BF4]) surfaces for the first time. The films, obtained without a solid substrate, can be facilely characterized by TEM and AFM to study the film formation and growth process.

Graphical abstract: Freestanding silicon films formed on ionic liquid surfaces

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Publication details

The article was received on 30 Sep 2012, accepted on 01 Nov 2012 and first published on 02 Nov 2012


Article type: Communication
DOI: 10.1039/C2TA00503D
Citation: J. Mater. Chem. A, 2013,1, 55-58
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    Freestanding silicon films formed on ionic liquid surfaces

    S. Cheng, L. Hu, W. Qin, F. Xiong and C. Li, J. Mater. Chem. A, 2013, 1, 55
    DOI: 10.1039/C2TA00503D

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