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Issue 2, 2012
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Photolithographic surface micromachining of polydimethylsiloxane (PDMS)

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Abstract

A major technical hurdle in microfluidics is the difficulty in achieving high fidelity lithographic patterning on polydimethylsiloxane (PDMS). Here, we report a simple yet highly precise and repeatable PDMS surface micromachining method using direct photolithography followed by reactive ion etching (RIE). Our method to achieve surface patterning of PDMS applied an O2 plasma treatment to PDMS to activate its surface to overcome the challenge of poor photoresist adhesion on PDMS for photolithography. Our photolithographic PDMS surface micromachining technique is compatible with conventional soft lithography techniques and other silicon-based surface and bulk micromachining methods. To illustrate the general application of our method, we demonstrated fabrication of large microfiltration membranes and free-standing beam structures in PDMS.

Graphical abstract: Photolithographic surface micromachining of polydimethylsiloxane (PDMS)

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Publication details

The article was received on 04 Aug 2011, accepted on 04 Nov 2011 and first published on 17 Nov 2011


Article type: Technical Note
DOI: 10.1039/C1LC20721K
Citation: Lab Chip, 2012,12, 391-395
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    Photolithographic surface micromachining of polydimethylsiloxane (PDMS)

    W. Chen, R. H. W. Lam and J. Fu, Lab Chip, 2012, 12, 391
    DOI: 10.1039/C1LC20721K

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