High-yield, large-scale production of few-layer graphene flakes within seconds: using chlorosulfonic acid and H2O2 as exfoliating agents

Wenbo Lu; Sen Liu; Xiaoyun Qin; Lei Wang; Jingqi Tian; Yonglan Luo; Abdullah M. Asiri; Abdulrahman O. Al-Youbi; Xuping Sun

doi:10.1039/C2JM16741G

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High-yield, large-scale production of few-layer graphene flakes within seconds: using chlorosulfonic acid and H₂O₂ as exfoliating agents†

Wenbo Lu,‡^a Sen Liu,^a Xiaoyun Qin,^a Lei Wang,^a Jingqi Tian,^ab Yonglan Luo,^a Abdullah M. Asiri,^cd Abdulrahman O. Al-Youbi^cd and Xuping Sun*^acd

Author affiliations

* Corresponding authors

^a State Key Lab of Electroanalytical Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, Jilin, China

^b Graduate School of the Chinese Academy of Sciences, Beijing 100039, China

^c Chemistry Department, Faculty of Science, King Abdulaziz University, Jeddah 21589, Saudi Arabia

^d Center of Excellence for Advanced Materials Research, King Abdulaziz University, Jeddah 21589, Saudi Arabia
E-mail: sunxp@ciac.jl.cn
Fax: +86-431-85262065
Tel: +86-431-85262065

Abstract

The present communication reports on a rapid exfoliation method for high-yield production of few-layer graphene flakes on a large scale from graphite within seconds with the use of chlorosulfonic acid and H₂O₂ as exfoliating agents.

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Article information

DOI: https://doi.org/10.1039/C2JM16741G
Article type: Communication
Submitted: 21 Dec 2011
Accepted: 20 Mar 2012
First published: 30 Mar 2012

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J. Mater. Chem., 2012,22, 8775-8777

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High-yield, large-scale production of few-layer graphene flakes within seconds: using chlorosulfonic acid and H₂O₂ as exfoliating agents

W. Lu, S. Liu, X. Qin, L. Wang, J. Tian, Y. Luo, A. M. Asiri, A. O. Al-Youbi and X. Sun, J. Mater. Chem., 2012, 22, 8775 DOI: 10.1039/C2JM16741G

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Journal of Materials Chemistry