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A high impact peer reviewed journal publishing experimental and theoretical work across the breadth of nanoscience and nanotechnology


Nondestructive volumetric 3-D chemical mapping of nickel-sulfur compounds at the nanoscale

Corresponding authors
Department of Mechanical Engineering, University of Connecticut, 191 Auditorium Road, Unit 3139, Storrs, USA
E-mail: wchiu@engr.uconn.edu
Tel: +860-486-3647
Center for Innovative Fuel Cell and Battery Technologies, School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, USA
E-mail: meilin.liu@mse.gatech.edu
Tel: +404-894-6114
Advanced Photon Source, Argonne National Laboratory, Building 401, 9700 South Cass Avenue, Argonne, USA
E-mail: yuwang@aps.anl.gov
Tel: +630-252-3789
NSLS-II, Brookhaven National Laboratory, Upton, USA
E-mail: ychu@bnl.gov
Tel: +631-344-5582
Nanoscale, 2012,4, 1557-1560

DOI: 10.1039/C2NR11690A
Received 09 Nov 2011, Accepted 06 Jan 2012
First published online 10 Jan 2012
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