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Issue 9, 2011
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Reversible structuring of photosensitive polymer films by surface plasmon near field radiation

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Abstract

We report on the fabrication and characterisation of a novel type of hybrid azo-modified photosensitive polymer film with a nanoscale metallic structuring integrated into the substrate. The metal structures permit to generate surface plasmon near fields when irradiated by UV-light from the rear without directly illuminating the polymer. This allows establishment of a localized, complex-shape intensity distribution at sub-wavelength resolution with a corresponding impact on the photosensitive polymer. The possibilities of exploiting this setup are manifold. We find that just by using the change of polarization of the incident light as means of control, the topography can be driven to change between various patterns reversibly. These results are confirmed by numerical simulations and compared with in situ recorded topography changes.

Graphical abstract: Reversible structuring of photosensitive polymer films by surface plasmon near field radiation

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Publication details

The article was received on 15 Oct 2010, accepted on 10 Dec 2010 and first published on 24 Jan 2011


Article type: Paper
DOI: 10.1039/C0SM01164A
Citation: Soft Matter, 2011,7, 4174-4178
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    Reversible structuring of photosensitive polymer films by surface plasmon near field radiation

    T. König, L. M. Goldenberg, O. Kulikovska, L. Kulikovsky, J. Stumpe and S. Santer, Soft Matter, 2011, 7, 4174
    DOI: 10.1039/C0SM01164A

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