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Edge Article

Anodic deposition of a robust iridium-based water-oxidation catalyst from organometallic precursors

Corresponding authors
Yale University, Department of Chemistry, PO Box 208107, New Haven, USA
Fax: +1 203 432-6144
Tel: +1 203 432-3925
Yale University, Department of Geology and Geophysics, PO Box 208109, New Haven, USA
Chem. Sci., 2011,2, 94-98

DOI: 10.1039/C0SC00418A
Received 07 Aug 2010, Accepted 12 Sep 2010
First published online 28 Oct 2010
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