This website uses cookies to give you the best user experience. If you continue
without changing your settings we'll assume you are happy to receive all RSC cookies.
You can change your cookie settings by navigating to our Privacy and Cookies page and following the instructions. These instructions
are also obtainable from the privacy link at the bottom of any RSC page.
Here we describe a new method for preparing multiple arrays of parallel goldnanowires with dimensions and separation down to 50 nm. This method uses photolithography to prepare an electrode consisting of a patterned nickel film on glass, onto which a gold and nickelnanowire array is sequentially electrodeposited. After the electrodeposition, the nickel is stripped away, leaving behind a goldnanowire array, with dimensions governed by the goldelectrodeposition parameters, spacing determined by the nickelelectrodeposition parameters, and overall placement and shape dictated by the photolithography.
Fetching data from CrossRef. This may take some time to load.