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Issue 7, 2011
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High-density gold nanowire arrays by lithographically patterned nanowire electrodeposition

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Abstract

Here we describe a new method for preparing multiple arrays of parallel gold nanowires with dimensions and separation down to 50 nm. This method uses photolithography to prepare an electrode consisting of a patterned nickel film on glass, onto which a gold and nickel nanowire array is sequentially electrodeposited. After the electrodeposition, the nickel is stripped away, leaving behind a gold nanowire array, with dimensions governed by the gold electrodeposition parameters, spacing determined by the nickel electrodeposition parameters, and overall placement and shape dictated by the photolithography.

Graphical abstract: High-density gold nanowire arrays by lithographically patterned nanowire electrodeposition

  • This article is part of the themed collection: Lithography
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Publication details

The article was received on 13 Jan 2011, accepted on 18 Feb 2011 and first published on 11 Mar 2011


Article type: Communication
DOI: 10.1039/C1NR10043B
Citation: Nanoscale, 2011,3, 2697-2699
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    High-density gold nanowire arrays by lithographically patterned nanowire electrodeposition

    J. E. Hujdic, A. P. Sargisian, J. Shao, T. Ye and E. J. Menke, Nanoscale, 2011, 3, 2697
    DOI: 10.1039/C1NR10043B

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