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Here we describe a new method for preparing multiple arrays of parallel goldnanowires with dimensions and separation down to 50 nm. This method uses photolithography to prepare an electrode consisting of a patterned nickel film on glass, onto which a gold and nickelnanowire array is sequentially electrodeposited. After the electrodeposition, the nickel is stripped away, leaving behind a goldnanowire array, with dimensions governed by the goldelectrodeposition parameters, spacing determined by the nickelelectrodeposition parameters, and overall placement and shape dictated by the photolithography.
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