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Issue 10, 2012
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Photolabile protecting groups in metal–organic frameworks: preventing interpenetration and masking functional groups

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Abstract

Photolabile groups can be incorporated into metal–organic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc(II). Subsequent photolysis unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.

Graphical abstract: Photolabile protecting groups in metal–organic frameworks: preventing interpenetration and masking functional groups

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Publication details

The article was received on 17 May 2011, accepted on 07 Jul 2011 and first published on 22 Jul 2011


Article type: Communication
DOI: 10.1039/C1CC12884A
Citation: Chem. Commun., 2012,48, 1574-1576
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    Photolabile protecting groups in metal–organic frameworks: preventing interpenetration and masking functional groups

    R. K. Deshpande, G. I. N. Waterhouse, G. B. Jameson and S. G. Telfer, Chem. Commun., 2012, 48, 1574
    DOI: 10.1039/C1CC12884A

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