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Issue 8, 2010
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Reactivity of selectively terminated single crystal silicon surfaces

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Abstract

As the cornerstone of multiple practical applications, silicon single crystal surfaces have attracted the interest of scientific and engineering communities for several decades. The most recent advances employ the surfaces precovered with a specific functionality to extend into the realm of organic and metal–organic films with well-defined interfaces, to protect the surfaces from oxidation and other contaminations, and to build the components of present and future molecular electronics and sensing devices. This critical review will focus on the reactivity of the selectively terminated Si(100) and Si(111) surfaces. The hydrogen and halogen-terminated surfaces are the most widely used and most heavily reviewed previously, thus only a brief summary will be given here with the emphasis of the most recent thermal approaches to functionalization of hydrogen-terminated silicon. The silicon surfaces precovered with NHx functionality are emerging as a very likely candidate both for the production of sharp interfaces and for coadsorption, co-assembly, and potential molecular templating of patterns on single crystalline surfaces. A brief overview of recent advances in achieving control over the hydroxyl-termination of silicon will be given. Some future directions for further development of chemistry, reactivity, and assembly on these surfaces, as well as potential applications, are highlighted in the last section (152 references).

Graphical abstract: Reactivity of selectively terminated single crystal silicon surfaces

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Publication details

The article was received on 11 Dec 2009 and first published on 01 Jul 2010


Article type: Critical Review
DOI: 10.1039/B822965C
Citation: Chem. Soc. Rev., 2010,39, 3256-3274
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    Reactivity of selectively terminated single crystal silicon surfaces

    K. A. Perrine and A. V. Teplyakov, Chem. Soc. Rev., 2010, 39, 3256
    DOI: 10.1039/B822965C

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