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Issue 48, 2009
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Complex three-dimensional conformal surfaces formed by atomic layer deposition: computation and experimental verification

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Abstract

Atomic layer deposition in complex three-dimensional porous materials is useful for manipulating properties such as pore size, pore connectivity, density, and dielectric constant. In order to calculate a material's properties it is necessary to determine the material distribution. A generally applicable algorithm for determining the material distribution and pore connectivity is presented. Calculations using the algorithm compared favorably with experimental results for the important case of infilling dielectric material into three-dimensional photonic crystal templates.

Graphical abstract: Complex three-dimensional conformal surfaces formed by atomic layer deposition: computation and experimental verification

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Publication details

The article was received on 16 Jul 2009, accepted on 30 Sep 2009 and first published on 06 Nov 2009


Article type: Paper
DOI: 10.1039/B914318A
Citation: J. Mater. Chem., 2009,19, 9126-9130
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    Complex three-dimensional conformal surfaces formed by atomic layer deposition: computation and experimental verification

    A. Brzezinski, Y. Chen, P. Wiltzius and P. V. Braun, J. Mater. Chem., 2009, 19, 9126
    DOI: 10.1039/B914318A

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