Issue 17, 2007
From the journal:

Journal of Materials Chemistry

Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers for sub-50 nm EUV lithography

Mingxing Wang,a   Kenneth E. Gonsalves,*a   Monica Rabinovich,a   Wang Yuehb  and  Jeanette M. Robertsb  

* Corresponding authors

a Polymer Nanotechnology Laboratory at Center for Optoelectronic and Optical Communications & Department of Chemistry, University of North Carolina, Charlotte, North Carolina, USA
E-mail: kegonsal@email.uncc.edu

b Intel Corp., Hillsboro, OR, USA

Abstract

A new series of anionic photoacid generators (PAGs) and corresponding polymers were prepared. The thermostability of PAG bound polymers was superior to that of PAG blend polymers. PAG incorporated into the polymer main chain showed improved resolution when compared with the PAG blend polymers. This was demonstrated by extreme ultraviolet lithography (EUVL) results: the fluorine PAG bound polymer resist gave 45 nm (1 : 1), 35 nm (1 : 2), 30 nm (1 : 3) and 20 nm (1 : 4) Line/Space as well as the 50 nm (1 : 1) elbow pattern.

Graphical abstract: Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers for sub-50 nm EUV lithography

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Article information

DOI
https://doi.org/10.1039/B617133H
Article type
Paper
Submitted
23 Nov 2006
Accepted
15 Jan 2007
First published
05 Feb 2007

J. Mater. Chem., 2007,17, 1699-1706

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Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers for sub-50 nm EUV lithography

M. Wang, K. E. Gonsalves, M. Rabinovich, W. Yueh and J. M. Roberts, J. Mater. Chem., 2007, 17, 1699 DOI: 10.1039/B617133H

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