Synthesis, characterization and application of Ni(tta)2·tmeda to MOCVD of nickel oxide thin films

Abstract

A novel nickel β-diketonate adduct, Ni(tta)₂·tmeda, has been synthesized using 2-thenoyltrifluoroacetone as the β-diketonate and N,N,N,′N′-tetramethylethylendiamine as the Lewis base. It has been characterized by elemental analyses, IR, ¹H NMR, ¹³C NMR spectroscopy and single-crystal X-ray diffraction studies. Physical and thermal properties of Ni(tta)₂·tmeda precursor have been also extensively investigated. Its efficacy as a metal–organic chemical vapour deposition (MOCVD) precursor for the growth of nickel oxide films has been fully tested by applying it to the deposition of NiO films on quartz substrate. NiO thin films have been characterized by X-ray diffraction (XRD), scanning electron microscopy and UV spectroscopy.