Ultraviolet photochemistry of trichlorovinylsilane and allyltrichlorosilane: vinyl radical (HCCH2) and allyl radical (H2CCHCH2) production in 193 nm photolysis
Abstract
The absolute gas phase ultraviolet
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* Corresponding authors
a
The Aerospace Corporation, 2350 E. El Segundo Blvd., El Segundo, USA
E-mail:
John.D.DeSain@aero.org
b
Combustion Research Facility, Sandia National Laboratories, Mail Stop 9055, Livermore, USA
E-mail:
cataatj@sandia.gov (CAT)
The absolute gas phase ultraviolet
J. D. DeSain, L. E. Jusinski and C. A. Taatjes, Phys. Chem. Chem. Phys., 2006, 8, 2240 DOI: 10.1039/B600755D
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