Issue 11, 2005
From the journal:

Journal of Materials Chemistry

Orientation of mesochannels in continuous mesoporous silica films by a high magnetic field†

Yusuke Yamauchi,ab   Makoto Sawada,a   Takashi Noma,c   Hidenosuke Ito,c   Seiichi Furumi,d   Yoshio Sakkad  and  Kazuyuki Kuroda*abef  

* Corresponding authors

a Department of Applied Chemistry, School of Science and Engineering, Waseda University, Ohkubo 3-4-1, Shinjuku-ku, Tokyo 169-8555, Japan
E-mail: kuroda@waseda.jp
Fax: +81-3-5286-3199
Tel: +81-3-5286-3199

b Graduate School of Science and Engineering, Waseda University, Ohkubo 3-4-1, Shinjuku-ku, Tokyo 169-8555, Japan

c Leading-Edge Technology Development Headquarters, Canon Inc., Morino-sato-Wakamiya 5-1, Atsugi-shi, Kanagawa 243-0193, Japan

d National Institute for Materials Science, Sengen 1-2-1, Tsukuba, Ibaraki 305-0047, Japan

e Kagami Memorial Laboratory for Materials Science and Technology, Waseda University, Nishi-waseda 2-8-26, Shinjuku-ku, Tokyo 169-0051, Japan

f CREST, Japan Science and Technology Agency, Honcho 4-1-8, Kawaguchi-shi, Saitama 332-0012, Japan

Abstract

The effect of a high magnetic field on the orientation of mesochannels in continuous mesoporous silica films is demonstrated; the orientation of mesochannels in the film can be induced parallel to the magnetic field, though the effect is not complete.

Graphical abstract: Orientation of mesochannels in continuous mesoporous silica films by a high magnetic field

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Article information

DOI
https://doi.org/10.1039/B418478E
Article type
Communication
Submitted
08 Dec 2004
Accepted
10 Feb 2005
First published
21 Feb 2005

J. Mater. Chem., 2005,15, 1137-1140

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Orientation of mesochannels in continuous mesoporous silica films by a high magnetic field

Y. Yamauchi, M. Sawada, T. Noma, H. Ito, S. Furumi, Y. Sakka and K. Kuroda, J. Mater. Chem., 2005, 15, 1137 DOI: 10.1039/B418478E

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