Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors†
Abstract
Thin films of ZrO2 and HfO2 have been deposited by liquid injection
* Corresponding authors
a
Department of Chemistry, University of Liverpool, Liverpool, UK
E-mail:
tjconsultancy@btconnect.com
b Department of Materials Science and Engineering, University of Liverpool, Liverpool, UK
c Epichem Limited, Power Road, Bromborough, Wirral, Merseyside, UK
d Department of Electrical Engineering and Electronics, University of Liverpool, UK
Thin films of ZrO2 and HfO2 have been deposited by liquid injection
Y. F. Loo, R. O'Kane, A. C. Jones, H. C. Aspinall, R. J. Potter, P. R. Chalker, J. F. Bickley, S. Taylor and L. M. Smith, J. Mater. Chem., 2005, 15, 1896 DOI: 10.1039/B417389A
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