Issue 14, 2004

Mononuclear precursor for MOCVD of HfO2 thin films

Abstract

We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(OiPr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.

Graphical abstract: Mononuclear precursor for MOCVD of HfO2 thin films

Supplementary files

Article information

Article type
Communication
Submitted
06 Apr 2004
Accepted
18 May 2004
First published
17 Jun 2004

Chem. Commun., 2004, 1610-1611

Mononuclear precursor for MOCVD of HfO2 thin films

A. Baunemann, R. Thomas, R. Becker, M. Winter, R. A. Fischer, P. Ehrhart, R. Waser and A. Devi, Chem. Commun., 2004, 1610 DOI: 10.1039/B405015K

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