Polymer-stabilized nano-sized tellurium films by laser-induced chemical vapour co-deposition process

Abstract

UV laser-irradiation of a gaseous mixture of dimethyl tellurium and 1,3-disilacyclobutane induces concurrent photolysis of both compounds. Chemical changes taking place are due to expulsion of elemental tellurium from dimethyl tellurium and formation of short-lived and fast polymerizing silene from 1,3-disilacyclobutane. The co-photolysis process results in chemical vapour co-deposition of a nano-sized tellurium–polycarbosilane composite that contains amorphous nano-structures of tellurium stabilized against oxidation by organosilicon polymer.