Issue 10, 2001
From the journal:

Journal of Materials Chemistry

C. Blackman,a   C. J. Carmalt,a   S. A. O'Neill,a   I. P. Parkin,*a   L. Apostilcob  and  K. C. Molloyb  

* Corresponding authors

a Department of Chemistry, University College London, 20 Gordon Street, London, UK
E-mail: i.p.parkin@ucl.ac.uk

b Department of Chemistry, University of Bath, Claverton Down, Bath, UK

Abstract

A facile new method for the preparation of large area titanium phosphide films on glass is described from the atmospheric pressure chemical vapour deposition of titanium tetrachloride and tert-butylphosphine.

Graphical abstract: Dual source atmospheric pressure chemical vapour deposition of TiP films on glass using TiCl4 and PH2But

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Article information

DOI
https://doi.org/10.1039/B105140G
Article type
Communication
Submitted
12 Jun 2001
Accepted
10 Aug 2001
First published
24 Aug 2001

J. Mater. Chem., 2001,11, 2408-2409

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Dual source atmospheric pressure chemical vapour deposition of TiP films on glass using TiCl4 and PH2But

C. Blackman, C. J. Carmalt, S. A. O'Neill, I. P. Parkin, L. Apostilco and K. C. Molloy, J. Mater. Chem., 2001, 11, 2408 DOI: 10.1039/B105140G

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