Evaluating two new Schiff bases synthesized on the inhibition of corrosion of copper in NaCl solutions

Abstract

Two kinds of new Schiff base derivatives, 2-((4-(4-(dimethylamino)styryl)phenylimino)methyl) (DSM) and its intermediate 4-(4-aminostyryl)-N,N-dimethylaniline (AND), form self-assembled monolayers (SAMs) on copper surfaces. The SAMs have been examined by a series of techniques, including contact angle (CA), atomic force microscope (AFM), scanning electronic microscope (SEM), and electrochemical measurements. The results suggest that the two derivatives adsorb onto the copper surface and generate corresponding hydrophobic films, which play an important role in the anticorrosion of copper in 3% NaCl solution. Quantum chemical calculations and molecular dynamics (MD) simulation are also used for further insight into the adsorption mechanism.