Issue 44, 2010

Non-sticky silicate replica mold by phase conversion approach for nanoimprint lithography applications

Abstract

We have developed a transparent, non-sticky silicate nano mold with high mechanical strength and excellent releasing properties through a simple phase conversion process of polyvinylsilazane (PVSZ) replica mold. This inexpensive inorganic polymer derived silicate mold does not require extra surface modification and could be used as an ideal mold with low adhesion force for nanoimprint lithographic applications. The silicate hard nano mold allows fabrication of sub-100 nm patterns down to 30 nm. The mold can be used for both UV and thermal NIL duplication processes in a repeated manner. The economic efficiency of the mold fabrication as well as the high durability and excellent releasing properties could be quite valuable to physical contact nanolithography for high-throughput fabrication of nano-devices.

Graphical abstract: Non-sticky silicate replica mold by phase conversion approach for nanoimprint lithography applications

Supplementary files

Article information

Article type
Paper
Submitted
04 Jun 2010
Accepted
25 Jul 2010
First published
28 Sep 2010

J. Mater. Chem., 2010,20, 9962-9967

Non-sticky silicate replica mold by phase conversion approach for nanoimprint lithography applications

S. Park, H. Park, O. H. Han, S. A. Chae, D. Lee and D. Kim, J. Mater. Chem., 2010, 20, 9962 DOI: 10.1039/C0JM01760D

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