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Low-temperature water gas shift reaction on Cu/SiO2 prepared…
Low-temperature water gas shift reaction on Cu/SiO2 prepared by an atomic layer epitaxy technique
Low-temperature water gas shift reaction on Cu/SiO2 prepared by an atomic layer epitaxy technique
Article, Chapter
Authors: Ching-Shiun Chen
Publication: Chemical Communications, Issue:40, Page(s):4983-4985
Published: 2008-10-16
ISSN: 1359-7345
DOI: 10.1039/B807428C
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View Full Text Source:Chemical Communications,Chemical Communications,RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Journal:  Chemical Communications Source:RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Collection:  RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Coverage:
  • 2008~present; ;issue:1~present
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