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Hollow cathode plasma-assisted atomic layer deposition of cr…
Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
Article, Chapter
Authors: Cagla Ozgit-Akgun
Publication: Journal of Materials Chemistry C, Volume:2, Issue:12, Page(s):2123-2136
Published: 2014-02-27
ISSN: 2050-7526
DOI: 10.1039/C3TC32418D
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View Full Text Source:Journal of Materials Chemistry C,Journal of Materials Chemistry C,RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Journal:  Journal of Materials Chemistry C Source:RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Collection:  RSC Gold Collection excluding journal archive '1841-2007' 2022 Opens in new Window
Coverage:
  • 2013~present; ;issue:1~present
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