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Atmospheric pressure atomic layer deposition of Al₂O₃ using …
Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
Article, Chapter
Authors: Moataz Bellah M MB Mousa
Publication: Langmuir, Volume:30, Issue:13, Page(s):3741-3748
Published: American Chemical Society, 2014-4-08
ISSN: 0743-7463
DOI: 10.1021/la500796r
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View Full Text Source:Langmuir,Langmuir,American Chemical Society Journals (Front Files) Opens in new Window
Journal:  Langmuir Source:American Chemical Society Journals (Front Files) Opens in new Window
Collection:  American Chemical Society Journals (Front Files) Opens in new Window
Coverage:
  • 1996-01-10~present; volume:12~present;issue:1~present
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